Auteur: Emmanuel Bigler
Date: 29-01-2005 18:12
Excellent idea, Dr Schmitt and thanks for posting your anouncement on galerie-photo.
I have in mind two Zeiss lenses for photolithography currently in use at our photomask fabrication facility at the university in Besançon. The machinery is californian but lenses are Zeiss. Unfortunately the lenses are deeply recessed inside the machine and not accessible, so I've never seen the glass, only the .8 micron linewidths generated by the photorepeater lens;-);-)
The first lens is a 1:10 demagnifier for the pattern generator, this lens demagnifies a rotating slit, max size 15x15mm, min size 4x4mm, to generate a photomask or a 10x reticle, smallest linewidth = 4 micron. There was an optional lens working at 1:20 with the same working distance allowing to go down to 2 microns.
The second lens is a photorepeater lens, 1:10 ratio, object field : 10x10 cm on 5"x5" reticles (127x127mm) ; image field : 1x1 cm resolution .8 micron linewidth, 0?7 at the centre. Wavelength 435 nm (mercury arc lamp). If I find the name and specs of those special beasts which have never seen daylight ;-) I'll send the info to you.
I have in mind another lens by Cerco for photomask fabrication from a paper drawing operating in green visible light ; the lens has been discontinued for a long time, Cerco is now a trade mark of another French company and still offers special lenses, an Internet search with "cerco lens" as keywords will yield the proper company name and web page.
Probably Henri Gaud might have some French-made apo lenses that could be added in your database as well.
And since you mention "monster lumen lenses", no doubt that the famous Carl Zeiss Makro-Q Gigantar described in the "Zeiss Compendium" by Charles Barringer & Marc James Small deserves a very special place in your database ;-);-)
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